Category Archives: Photo Etching

Photo etching, also known as chemical etching, is a metal fabrication process that uses a light-sensitive photoresist to create a pattern on a metal sheet. The metal is then immersed in an etchant solution, which selectively dissolves the unprotected areas, leaving behind the desired pattern with high precision and fine details. This process is ideal for complex and intricate designs in thin metal sheets.

Wet Etching Tantalum

Tantalum, a rare and exceptional metal, possesses unique properties that make it highly sought-after in various industries, including aerospace, electronics, and medical devices.

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Metal Etching
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Tantalum

Types of Tantalum and Alloys: Advantages and Disadvantages for Wet Processing

Tantalum comes in various forms, and alloying it with other elements can enhance specific attributes. Let’s explore the advantages and disadvantages of each alloy for wet processing:

  1. Pure Tantalum: Advantages include excellent corrosion resistance, making it ideal for chemical processing equipment and medical implants. However, its high ductility can lead to deformation during certain etching processes.
  2. Tantalum-Tungsten (Ta-W): This alloy offers increased strength and hardness, making it suitable for high-stress applications such as jet engine components. However, its hardness may require careful consideration during etching to avoid cracking.
  3. Tantalum-Niobium (Ta-Nb): The addition of Niobium improves Tantalum’s formability and helps reduce the risk of embrittlement during the etching process. This alloy is commonly used in the production of superalloys and electronics.

Metal Etching Tantalum

Metal etching is a fundamental process used to shape, pattern, or remove material from Tantalum surfaces. In the wet processing process, metal etching machines are commonly employed. Let’s explore the key aspects of metal etching for Tantalum:

  1. Etching Difficulty: Tantalum’s resistance to corrosion poses challenges during etching. Hydrofluoric Acid (HF), Ferric Chloride Etchant, and Cupric Chloride Etchant are common etchants used for Tantalum. HF is highly corrosive and requires careful handling to achieve precise etching, while Ferric Chloride Etchant offers deep and well-defined patterns. Cupric Chloride Etchant provides controlled etching and is commonly used in electronic applications.
  2. Precautions: Due to the corrosive nature of etchants, strict safety precautions are essential. Proper ventilation, personal protective equipment, and adherence to handling protocols are necessary to prevent exposure to hazardous fumes and chemical burns.

One of the recommended alkaline etchants for etching Tantalum is a solution of Potassium Hydroxide (KOH). Potassium Hydroxide is a strong base and can effectively etch Tantalum by removing thin layers of the material.

The etching process with Potassium Hydroxide is typically performed at elevated temperatures to enhance its etching capabilities. The etching rate and selectivity can be controlled by adjusting the concentration of the Potassium Hydroxide solution and the temperature.

It’s important to handle Potassium Hydroxide with care as it is caustic and can cause skin and eye irritation. Proper safety measures, including the use of protective equipment and good ventilation, should be observed when working with Potassium Hydroxide for Tantalum etching.

Tantalum etching equipment

Tantalum etching equipment

Photo Etching Tantalum

Photo etching, also known as chemical milling, offers precise and intricate patterns on Tantalum surfaces. The process involves using light-sensitive masks to protect specific areas while etching the exposed regions. Let’s explore the key aspects of photo-etching for Tantalum:

  1. Processing Difficulty: Photo-etching demands exceptional accuracy and control. The photoresist must be carefully applied and developed to ensure accurate pattern transfer onto the Tantalum surface. The use of advanced photolithography techniques and skilled expertise is crucial to achieving the desired precision.
  2. Precautions: Handling of the photoresist requires a clean and controlled environment to prevent contamination. Careful adherence to processing times and temperatures during development ensures precise pattern transfer without overreaching or under etching.

Etching precision-machined Tantalum materials is a highly specialized process that requires a thorough understanding of the different types and alloys of Tantalum, as well as the intricacies of electroforming, surface treatment, metal cleansing, and etching techniques. By selecting the most suitable processes and adhering to necessary precautions, Tantalum materials can continue to revolutionize industries and offer innovative solutions to complex engineering challenges.

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Etching Tantalum Process Guidelines

Metal AlloyEtchantEtching Temperature (°C)Etching Concentration (%)Estimated Etching Depth (microns)Etching Quality
Etching Pure TantalumHydrofluoric Acid (HF)Room temperature5% HF10-40High-quality (smooth)
Etching Tantalum-Tungsten (Ta-W)Ferric Chloride EtchantRoom temperature10% FeCl310-50High-quality (smooth)
Etching Tantalum-Niobium (Ta-Nb)Cupric Chloride EtchantRoom temperature10% CuCl210-50High-quality (smooth)
Etching Tantalum-Niobium (Ta-Nb)Potassium Hydroxide (KOH)Room temperature10-20% KOH10-50High-quality (smooth)
Etching Tantalum Process Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the tantalum or tantalum alloy surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, especially in the case of Hydrofluoric Acid.

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    Wet Etching Molybdenum

    Wet Etching Machining Molybdenum, Molybdenum, a refractory metal with exceptional mechanical properties and high melting point, has become a critical material in various industries.

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    Wet Metal Etching Production workshop-  Shenzhen Xinxin Precision Equipment Co., Ltd.
    Molybdenum etching production facility

    Types of Molybdenum and Alloys

    Molybdenum exists in various forms and alloys, each designed to suit specific industrial demands. Some common types include:

    Machining Molybdenum
    1. Pure Molybdenum: Known for its high strength and heat resistance, pure Molybdenum is often used in high-temperature applications such as aerospace and defense.
    2. Molybdenum-Tungsten (Mo-W): This alloy combines the strength and thermal conductivity of Molybdenum with the excellent mechanical properties of Tungsten, making it ideal for electrical and electronic components.
    3. Molybdenum-Rhenium (Mo-Re): The addition of Rhenium enhances Molybdenum’s ductility and high-temperature performance, making it suitable for applications in aerospace propulsion systems.
    4. Molybdenum-Tungsten(MoCu): Molybdenum-copper is a composite material consisting of molybdenum and copper. It possesses properties similar to tungsten copper and offers adjustable coefficients of thermal expansion and thermal conductivity. However, molybdenum-copper has a lower density compared to tungsten-copper, making it more suitable for aerospace and other applications. This product exhibits high purity, uniform structure, and excellent performance.

    Metal Etching Molybdenum

    Metal etching is an essential process used to shape, pattern, or remove material from Molybdenum surfaces. Wet etching, using metal etching machines, is commonly employed for this purpose. The choice of a suitable etchant depends on the desired results and the processing difficulty involved. Common etchants for Molybdenum include Hydrofluoric Acid (HF), Ferric Chloride Etchant, and Cupric Chloride Etchant. Proper handling and safety precautions are essential due to their corrosive nature.

    One of the recommended alkaline etchants for molybdenum etching is a solution of Sodium Hydroxide (NaOH). Sodium Hydroxide is a strong base and can effectively be etching molybdenum by removing thin layers of the material.

    The etching process with Sodium Hydroxide is generally done at elevated temperatures to increase its effectiveness. However, it’s essential to handle Sodium Hydroxide with care as it is caustic and can cause skin and eye irritation. Appropriate safety measures, including protective equipment and proper ventilation, should be used when working with Sodium Hydroxide for molybdenum etching.

    Molybdenum etching equipment

    Molybdenum etching equipment

    Photo Etching Molybdenum

    Photo etching, or chemical milling, offers precise and intricate patterns on Molybdenum surfaces. The process involves using light-sensitive masks to protect specific areas while etching the exposed regions. Skilled expertise is crucial to achieving the desired precision in the final product, and careful handling of the photoresist is necessary to ensure accurate pattern transfer.

    Precision machining of metal Molybdenum materials opens the door to endless possibilities in advanced technologies. Understanding the different types and alloys of Molybdenum, along with exploring the complexities of electroforming, surface treatment, metal cleansing, and etching processes, allows manufacturers and engineers to harness the full potential of this remarkable material. By selecting the most suitable processes and adhering to necessary precautions, Molybdenum materials can continue to drive innovation, enhance performance, and push the boundaries of modern engineering across various industries.

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    Etching Molybdenum Process Guidelines

    Metal AlloyEtchantEtching Temperature (°C)Etching Concentration (%)Estimated Etching Depth (microns)Etching Quality
    Etching Pure MolybdenumHydrofluoric Acid (HF)Room temperature5% HF10-40High-quality (smooth)
    Etching Molybdenum-TungstenFerric Chloride EtchantRoom temperature10% FeCl310-50High-quality (smooth)
    Etching Molybdenum-Rhenium (Mo-Re)Cupric Chloride EtchantRoom temperature10% CuCl210-50High-quality (smooth)
    Etching Molybdenum-Tungsten (MoCu)Sodium Hydroxide (NaOH)Room temperature10-20% NaOH10-50High-quality (smooth)
    Etching Molybdenum Process Guidelines

    The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the molybdenum or molybdenum alloy surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, especially in the case of Hydrofluoric Acid.

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      Wet Etching Brass

      Brass, a versatile and aesthetically pleasing alloy, has been a popular choice in various industries for centuries.

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      Wet Metal Etching Production workshop-  Shenzhen Xinxin Precision Equipment Co., Ltd.
      Brass etching production facility

      Types of Brass and Alloys

      Brass comes in various compositions and alloys, each tailored to meet specific requirements. Some common types include:

      1. Alpha Brass: Containing up to 40% zinc, Alpha Brass is highly malleable and can be easily cold-worked, making it suitable for applications like musical instruments and decorative items.
      2. Alpha-Beta Brass: With a zinc content of 40-45%, Alpha-Beta Brass exhibits both malleability and increased strength, ideal for applications that demand a balance between formability and durability.
      3. Beta Brass: Comprising more than 45% zinc, Beta Brass offers exceptional strength and hardness, making it suitable for components requiring high performance, such as springs and fasteners.

      Metal Etching Brass

      Metal etching is a fundamental process used to shape, pattern, or remove material from Brass surfaces. Wet etching, using etching machines, is commonly employed for this purpose. The selection of a suitable etchant depends on the desired results and the processing difficulty involved. Common etchants for Brass include:

      • Hydrofluoric Acid (HF): A highly corrosive etchant suitable for removing thin layers of Brass and achieving precise etching. Safety precautions should be followed during handling.
      • Ferric Chloride Etchant: Widely used for etching Brass due to its ability to create deep and well-defined patterns. Proper disposal and handling are essential due to its corrosive nature.
      • Cupric Chloride Etchant: Offers controlled etching and is commonly used in electronic applications. Proper ventilation is necessary as it releases hazardous fumes.

      there are several recommended alkaline etchants for etching Brass. Brass is an alloy of copper and zinc, and its etching process typically involves using alkaline solutions. Here are some commonly used alkaline etchants for etching Brass:

      • Ammonium Persulfate (NH4)2S2O8: Ammonium persulfate is a widely used alkaline etchant for Brass. It is relatively safe to handle compared to some other etchants.
      • Cupric Chloride (CuCl2): Cupric chloride is an effective alkaline etchant for Brass, providing controlled and precise etching.
      • Ferric Chloride (FeCl3): While Ferric chloride is more commonly used as an acidic etchant for copper, it can also be used as an alkaline etchant for Brass when mixed with suitable alkaline additives.
      • Alkaline Cyanide Solutions: Alkaline cyanide solutions can be used for etching Brass, but they are highly toxic and require careful handling and disposal. Therefore, extreme caution should be exercised when using cyanide-based etchants.
      • Alkaline Electrolytes: Some alkaline electrolytes can also be used for etching Brass, particularly in electrochemical etching processes.

      Brass etching equipment

      Brass etching equipment

      Photo Etching Brass

      Photo etching, also known as chemical milling, offers precise and intricate patterns on Brass surfaces. The process involves using light-sensitive masks to protect specific areas while etching the exposed regions. The difficulty lies in handling the photoresist and ensuring accurate pattern transfer. Skilled expertise is crucial to achieve the desired precision in the final product.

      The beauty and versatility of precision-processed metal Brass materials have made them an integral part of numerous industries. Understanding the different types and alloys of Brass, along with exploring the complexities of electroforming, surface treatment, metal cleansing, and etching processes, allows manufacturers and engineers to harness the full potential of Brass. By selecting the most suitable processes and adhering to necessary precautions, Brass materials can continue to contribute to cutting-edge technology, aesthetics, and innovation across various domains.

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      Etching Brass Process Guidelines

      Brass TypeEtchantEtching Temperature (°C)Etching Concentration (%)Estimated Etching Depth (microns)Etching Quality
      Etching Alpha BrassHydrofluoric Acid (HF)Room temperature5% HF10-40High-quality (smooth)
      Etching Alpha-Beta BrassFerric Chloride EtchantRoom temperature10% FeCl310-50High-quality (smooth)
      Etching Beta BrassCupric Chloride EtchantRoom temperature10% CuCl210-50High-quality (smooth)
      Etching Alpha BrassSodium Hydroxide (NaOH)Room temperature10-20% NaOH10-50High-quality (smooth)
      Etching Alpha-Beta BrassAmmonium Persulfate ((NH4)2S2O8)Room temperature10% APS10-50High-quality (smooth)
      Etching Beta BrassFerric Chloride (FeCl3)Room temperature10% FeCl310-50High-quality (smooth)
      Etching Alpha BrassAlkaline Cyanide SolutionsRoom temperatureVaries10-50High-quality (smooth)
      Etching Alpha-Beta BrassAlkaline ElectrolytesRoom temperatureVaries10-50High-quality (smooth)
      Etching Brass Process Guidelines

      The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the brass surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, especially in the case of Hydrofluoric Acid and cyanide solutions.

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        Wet Etching Rhenium

        Rhenium, a rare and valuable refractory metal, has gained widespread recognition for its extraordinary properties, including an exceptionally high melting point (3,180°C/5,756°F), excellent mechanical strength, and remarkable resistance to wear and corrosion.

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        Wet Metal Etching Production workshop-  Shenzhen Xinxin Precision Equipment Co., Ltd.
        Rheniumetching production facility

        Types of Rhenium and Alloys

        Pure Rhenium (Re) is highly valued for its purity and exceptional mechanical properties, but it is often alloyed with other metals to enhance specific attributes. Some common Rhenium alloys include:

        a. Rhenium-Molybdenum (Re-Mo): This alloy combines the superior ductility and formability of Molybdenum with Rhenium’s high-temperature strength and resistance to oxidation, making it ideal for applications in jet engines, rocket nozzles, and furnace components.

        b. Rhenium-Tungsten (Re-W): Re-W alloys boast enhanced mechanical properties, such as increased strength and hardness, and are commonly used in aerospace and electrical applications.

        c. Rhenium-Iridium (Re-Ir): The Re-Ir alloy offers improved creep resistance and high-temperature stability, making it suitable for use in thermocouples and other high-temperature measurement devices.

        Metal Etching Rhenium

        Metal etching is a fundamental process used to shape, pattern, or remove material from Rhenium surfaces. Wet etching, using etching machines, is commonly employed for this purpose. The selection of a suitable etchant depends on the desired results and the processing difficulty involved. Common etchants for Rhenium include:

        a. Hydrofluoric Acid (HF): A highly corrosive etchant suitable for removing thin layers of Rhenium and achieving precise etching.

        b. Ferric Chloride Etchant: Widely used for etching Rhenium due to its ability to create deep and well-defined patterns.

        c. Cupric Chloride Etchant: Offers controlled etching and is commonly used in electronic applications.

        Rhenium is a relatively rare and expensive metal, and its etching process often involves using acid-based etchants like Hydrofluoric Acid (HF) or Ferric Chloride Etchant.

        Acid-based etchants are typically more effective in removing Rhenium and achieving precise etching results. Hydrofluoric Acid, in particular, is commonly used for Rhenium etching due to its high reactivity with the metal.

        Rhenium etching equipment

        rhenium etching equipment

        Photo Etching Rhenium

        Photo etching, also known as chemical milling, offers precise and intricate patterns on Rhenium surfaces. The process involves using light-sensitive masks to protect specific areas while etching the exposed regions. The difficulty lies in handling the photoresist and ensuring accurate pattern transfer. Skilled expertise is crucial to achieve the desired precision in the final product.

        Precision-machined metal Rhenium materials are an essential component in modern technological advancements. From understanding the different types and alloys of Rhenium to navigating through the challenges of surface treatment, metal cleansing, and etching processes, manufacturers and engineers must prioritize careful selection and expertise. By doing so, they can unlock the full potential of Rhenium, utilizing its remarkable properties to revolutionize technology and engineering across diverse industries.

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        Etching Rhenium Processing Guide

        Metal AlloyEtchantTemperature (°C)Concentration (%)Estimated Etch Depth (microns)Etch Quality
        Etching Rhenium-MHydroflu205%10-30High-quality (smooth)
        Etching Rhenium-MolybdenumFerric Chloride Etchant2510%20-50Moderate-quality (etched)
        Etching Rhenium-MolybdenumCupric Chloride Etchant3015%30-70Low-quality (rough)
        Etching Rhenium-TungstenHydrofluoric Acid (HF)205%12-35High-quality (smooth)
        Etching Rhenium-TungstenFerric Chloride Etchant2510%25-60Moderate-quality (etched)
        Etching Rhenium-TungstenCupric Chloride Etchant3015%40-90Low-quality (rough)
        Etching Rhenium-IridiumHydrofluoric Acid (HF)205%15-40High-quality (smooth)
        Etching Rhenium-IridiumFerric Chloride Etchant2510%30-75Moderate-quality (etched)
        Etching Rhenium-IridiumCupric Chloride Etchant3015%50-110Low-quality (rough)
        Etching Rhenium Processing Guide

        Please note that the estimated etch depths and etch quality may vary based on factors such as exposure time, surface condition, and specific etching conditions. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals.

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          Etching Rhenium Samples