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Guide to Drawing Standard Etching Design

15/09/2023 wetetched.com

Wet etching is a fundamental process in microfabrication, allowing precise material removal to create intricate patterns and structures on substrates. The success of wet etching hinges on a series of design criteria that engineers and scientists must meticulously consider. In this blog, we will explore the key design criteria for wet etching, focusing on assumptions, dimensions, and the importance of hole size in achieving the desired results.

Design Criteria for Wet Etching

Assumptions Matter: Before delving into the design criteria, it’s crucial to set the right assumptions. For instance, in the case of wet etching, we assume a specific thickness. For the purpose of this discussion, let’s consider a thickness ranging from 0.1mm.
Etching design formulas versus material thickness: Assuming a material thickness of 0.1mm, one of the first design criteria to consider is the hole diameter. To ensure proper etching, it’s often recommended to make the hole slightly larger than the material thickness. In this case, 1.2 times the material thickness would be 0.1mm * 1.2 = 0.12mm. Therefore, if the material thickness is 0.1mm, the hole should be designed to have a diameter of at least 0.12mm.
Material Choice: The choice of material plays a significant role in wet etching. Different materials react differently to etchants. Engineers must select materials that are compatible with the chosen etchant to ensure a successful process.
Hole Size Matters: The size of the holes created during wet etching is a critical design criterion. Smaller holes may lead to incomplete material removal, while larger holes may compromise structural integrity. Typically, materials with a thickness of 100μm or less can accommodate holes with a diameter of 0.12mm or more. Larger holes often result in more aesthetically pleasing and structurally sound outcomes.
Alignment and Precision: Achieving precise alignment of the etched features is vital. Design drawings should incorporate alignment markers or registration features to ensure accurate positioning during the etching process. This is particularly crucial when dealing with multilayer structures or when specific patterns must be aligned with pre-existing features.
Minimum Feature Size: It’s advisable to establish a minimum feature size for your design drawings. For instance, it’s generally recommended that no marked details be smaller than 0.1mm. This corresponds to 100μm. Maintaining a minimum feature size helps ensure that the etching process can accurately replicate the desired patterns and structures without the risk of incomplete or distorted etching.
Quality Control and Inspection: Design criteria should include provisions for quality control and inspection during and after the wet etching process. This involves specifying methods and tools for verifying that the final product meets the intended design specifications. Inspection processes may include optical microscopy, surface profilometry, or other measurement techniques to validate critical dimensions and surface finish.

Conclusion

Wet etching is a precise and versatile process used in microfabrication and nanotechnology. Proper design criteria are essential for achieving the desired results. By considering factors such as material thickness, hole size, material choice, alignment, surface finish, and etchant properties, engineers can ensure successful wet etching processes that meet the demands of various applications. The art of wet etching lies in the meticulous attention to these design criteria, resulting in finely etched structures that drive innovation across multiple industries.

If you have more discussions about etching standards, please contact me to add them and cite the source!

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How to choose a photochemical etching company?

14/09/2023 wetetched.com

How do I select a photochemical etching service company if I need to use photochemical etching brass for a project right now?

Experience and Expertise:

Ensure that the company you choose has ample experience and expertise, particularly in dealing with brass.

They should understand the characteristics of brass to effectively perform photochemical etching.

Equipment and Technology:

Familiarize yourself with the equipment and technology the company uses. Modern equipment often provides higher precision and efficiency. Ensure that their equipment and technology align with the requirements of your project.

Quality Control:

Inquire about the company’s quality control processes. They should have rigorous quality control standards to ensure your project meets the expected quality standards.

Project Scale:

Consider the scale of your project. Some companies may be better suited for large production batches, while others specialize in small batches or custom projects. Choose a company that fits the scale of your project.

Delivery Time:

Understand the company’s delivery times. If you have time constraints, ensure that the company can complete the project on schedule.

Cost and Budget:

Lastly, consider costs and your budget. Discuss project costs with the company and ensure they align with your budget.

Photochemical Etching Service Specialists

No1:Dragon Etching

Dragon Etching are a dedicated team of experts specializing in Photochemical Etching services and manufacturing.

Why Choose Dragon Etching?

Dragon Etching stands out from other Photochemical Etching service providers in several key ways:

In-House Machine Manufacturing: We are not just a service provider; we also manufacture Photochemical Etching machines. Click here to learn about the Photochemical Etching Equipment Selection Guide. This unique capability allows us to offer customized solutions, tailored to your specific needs. Whether you need our services or a customized DIV Photochemical Etching Machine, we have you covered.
Advanced Laboratory Facilities: Our state-of-the-art laboratories are equipped with the latest machinery and technology, ensuring consistent and high-quality results for our clients.
Rapid Turnaround: We understand the importance of timely project completion. Our streamlined processes enable us to offer some of the fastest turnaround times in the industry, ensuring your projects are completed efficiently and on schedule.

No2:Wet Etching

In the realm of Photochemical Etching, Wet Etching is a prominent and indispensable process. It’s a method that involves selectively removing material from a substrate using chemical solutions. This process is widely employed in various industries for its ability to precisely define intricate patterns on different materials, making it essential for applications such as microelectronics, semiconductor fabrication, and precision engineering.

Meet WET ETCHING – The Pioneers of Wet Etching

In the world of Wet Etching, one company stands out as a true industry leader – WET ETCHING. With a rich history of innovation and a commitment to excellence, WET ETCHING has redefined the standards of wet etching in the world of photochemical processes.

Leadership in Wet Etching

Cutting-Edge Technology: WET ETCHING has consistently pushed the boundaries of wet etching technology. They employ cutting-edge machinery and state-of-the-art chemical solutions to achieve precision and efficiency that surpass industry norms. Their dedication to research and development keeps them at the forefront of technological advancements in the field.

Experienced Team: At WET ETCHING, it’s not just about the technology; it’s also about the people. Their team of seasoned experts boasts extensive experience in wet etching, allowing them to tackle complex projects with finesse. Their skillful hands and keen eyes ensure that each etching process is executed flawlessly.

Custom Solutions: Recognizing that each project has its unique requirements, WET ETCHING specializes in providing tailored solutions. Whether it’s semiconductor components, microelectromechanical systems (MEMS), or intricate precision parts, WET ETCHING can design a wet etching process that perfectly aligns with the specific demands of the project.

Stringent Quality Control: The hallmark of WET ETCHING’s leadership is their unwavering commitment to quality control. Every product that leaves their facility undergoes rigorous testing and inspection to guarantee precision and reliability. Clients can trust that their projects are in safe hands when partnering with WET ETCHING.

Collaborative Approach: WET ETCHING’s success isn’t just a testament to their technology and expertise; it’s also a result of their collaborative approach. They actively engage with their clients, fostering a partnership that ensures project success. By understanding their clients’ needs, challenges, and goals, they deliver wet etching solutions that exceed expectations.

In the world of wet etching, WET ETCHING is more than just a company; it’s a beacon of innovation and precision. Their leadership in photochemical etching is a testament to their unwavering dedication to pushing the boundaries of what’s possible. With cutting-edge technology, a skilled team, and a commitment to quality, WET ETCHING continues to shape the future of wet etching, one precise etch at a time.

No3：Precision Micro

Pioneers in photochemical etching. Market-leading photochemical machining company supplying precision-etched metal components to exacting specifications

The leading photochemical etching service for 60 years.

From stainless steels to nickel, copper, aluminium and more, we’ve been innovating photochemical machining technology for more than half a century.

We produce and supply millions of precision photo-etched components every year for industry-leading companies all over the world, stretching the boundaries of micro-precision component manufacture.

No4:Masteretch

Masteretch design and manufacture chemical etching equipment. From small-scale laboratory machines to large mass production etching lines, Masteretch serve a wide range of industries.

Beyond our core range of equipment we can also deliver tailored etching solutions designed to meet your unique requirements. Our expertise in fabrication and design allows us to offer a high degree of customization to help our customers achieve their objectives.

Masteretch systems are expertly designed, assembled in-house at our UK facility and fully tested prior to shipping. Our equipment is designed to operate at maximum efficiency and for long term use at high volume production levels. Masteretch systems are renowned for their dependability, low operating and maintenance costs, making Masteretch the equipment supplier of choice for many of the world’s leading etching companies.

No5:ADVANCED METAL ETCHING, INC.

We understand that the success of your project depends on delivering quality parts manufactured at the right cost and within your timeline. We know the challenges of choosing the proper manufacturing process for your parts, and we’re here to help you navigate the process quickly and confidently.

Our custom metal parts manufacturing facility specializes in the photo etching and laser cutting processes. Both provide the highest quality and precision for today’s part designs. With a keen eye for spotting potential issues, we ensure that your part is the first step toward a successful product launch, and we strive to eliminate unnecessary delays.

Our team is dedicated to providing exceptional service and responsive attention to keep you in control of your project and out of the dark.

No6:Interplex

As a world leader in designing and manufacturing interconnect and mechanical products, we solve complex customer challenges and bring ideas to life.

We create value by helping our customers reduce their Total Cost of Ownership through utilizing our technical expertise, vertically integrated manufacturing, global footprint and innovative technologies enabling us to deliver interconnect products shaping the fields of Mobility, Medical, and Information & Communications.

No7:Elcon

Whether in fully custom prototyping or high-volume production, we employ team-wide expertise in each of our core disciplines to provide precision parts that are built to succeed.

In addition to collaborating on outside-the-box applications, we also specialize in the manufacture of key precision products, all designed and built for critical applications.

No8:TMN

Founded in 2011, TMN Etch specializes in photo chemical etching (PCE), serving worldwide companies with custom precision metal parts to meet their needs. The photo chemical etching process can be applied in a wide range of raw materials, such as stainless steel 300 series, brass alloy, copper alloy, aluminum, chrome, and other special metal alloys. With the photo chemical etching process, TMN Etch provides prototypes according to your drawings within 3 days without any tooling cost, and you can modify your designs whenever you want. Free samples, shorter lead time, tighter tolerance, higher precision, and lower cost for high volume production are the promises of TMN Etch to you.

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Germanium

04/08/2023 wetetched.com

Germanium is a unique semiconductor material with excellent optical and electrical properties. Its high refractive index, low absorption coefficient, and good thermal conductivity make it valuable in various applications, including infrared optics and electronics.

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Our Germanium etching production facility

Wet Metal Etching Production workshop- Shenzhen Xinxin Precision Equipment Co., Ltd. — Our Germanium etching production facility

Germanium Characteristics:

Germanium possesses several key properties that contribute to its diverse applications:

Optical Transparency: Germanium is transparent in the infrared region, making it valuable for infrared optics and lenses.
High Refractive Index: Germanium’s high refractive index allows for efficient light bending, suitable for lenses and prisms.
Electrical Properties: Germanium is a semiconductor material with good electrical conductivity, making it useful in electronic devices.
Thermal Conductivity: Germanium has reasonable thermal conductivity, aiding in heat dissipation.

Metal Etching Germanium:

Metal etching is a precise process used to selectively remove material from the surface of germanium to create intricate patterns and designs. When etching germanium, the choice of etchant is critical for achieving optimal results:

Hydrogen Peroxide (H2O2) and Hydrochloric Acid (HCl) Solution: Advantages: This mixture is effective for etching germanium due to its ability to dissolve germanium oxide.
Bromine (Br2) and Methanol (CH3OH) Solution: Advantages: Bromine and methanol solution can be used for controlled etching of germanium, providing precise pattern transfer.

Germanium etching equipment

Wet Chemical S650 **Germanium** **Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Germanium etching machine

The Germanium etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Germanium etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Germanium:

Photo etching is a precise process used for intricate designs on germanium:

Material Film: Photomasks made of high-quality polymer films with excellent UV resistance are recommended for precise and detailed etching.
Temperature Control: Maintain a stable and controlled temperature during the photoresist exposure and development process to ensure accurate pattern transfer.

Germanium’s exceptional optical and electrical properties make it a valuable material for infrared optics and electronic devices. By understanding the etchants, surface treatment methods, electroforming techniques, metal cleaning, and photo etching processes for germanium, manufacturers can achieve exceptional results without compromising the material’s integrity. Applying these insights will enable the production of high-quality germanium components for diverse applications, ranging from infrared imaging to electronic devices and beyond.

View our metal etching products

how to etch Germanium?

Etching Germanium Process Guidelines

Metal	Etchant	Temperature (°C)	Concentration (%)	Estimated Etch Depth (microns)	Etch Quality
Germanium	H2O2 and HCl (Aqua Regia)	Room temperature	3% H2O2, 30% HCl	1-5	High-quality (smooth)
Germanium	Bromine (Br2) and Methanol (CH3OH)	Room temperature	10% Br2, Methanol	5-20	Moderate-quality (etched)

The values provided are approximate and can vary depending on specific etching conditions, including exposure time, agitation, and the condition of the Germanium surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, especially in the case of Aqua Regia.

If you have metal wet etching Germanium needs, please feel free to contact us.

FAQs

[FAQS]

Etching Germanium Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Gallium Nitride (GaN)

04/08/2023 wetetched.com

Gallium Nitride (GaN) is a semiconductor material that has gained significant attention in recent years due to its exceptional electronic properties. Its wide bandgap, high electron mobility, and thermal conductivity make it a promising material for high-power and high-frequency electronic devices.

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View our GaN etching production facility

Metal Etching — GaN etching production facility

Gallium Nitride Characteristics:

Gallium Nitride possesses several key properties that contribute to its growing applications in the semiconductor industry:

Wide Bandgap: Gallium Nitride has a wide bandgap of approximately 3.4 eV, enabling it to handle high voltages and operate at high temperatures.
High Electron Mobility: GaN exhibits high electron mobility, making it suitable for high-frequency and high-power electronic devices.
Thermal Conductivity: Gallium Nitride has excellent thermal conductivity, allowing it to dissipate heat efficiently.
Stability: GaN is chemically stable, providing durability in harsh environments.

Metal Etching Gallium Nitride:

Metal etching is a precise process used to selectively remove material from the surface of Gallium Nitride to create intricate patterns and designs. When etching Gallium Nitride, the choice of etchant is critical for achieving optimal results:

Inductively Coupled Plasma (ICP) Dry Etching: ICP dry etching is a common method for etching GaN. Gases such as chlorine (Cl2), bromine (Br2), and sulfur hexafluoride (SF6) are used in ICP etching processes to react with GaN, selectively removing material. The choice of gas depends on the specific etch rate and selectivity requirements.
Reactive Ion Etching (RIE): RIE is another dry etching technique used for GaN. It involves using reactive gases, such as chlorine or fluorine-based compounds, in a low-pressure plasma to etch the GaN surface selectively.
Plasma Etching: Plasma etching using various gases can be used for precise and controlled etching of GaN. Common gases used include SF6 and O2, which can create a chemically reactive plasma to etch GaN.
Hot Phosphoric Acid (H3PO4): Hot phosphoric acid can be used for wet etching of GaN. It is a selective etchant that can remove GaN while leaving other materials intact. However, it requires high-temperature conditions and can be corrosive.
Potassium Hydroxide (KOH): KOH can also be used as a wet etchant for GaN. It’s a more gentle etchant compared to hot phosphoric acid and is often used for slower, isotropic etching.
Hydrochloric Acid (HCl): Dilute hydrochloric acid solutions can be used for wet etching of GaN under certain conditions. The selectivity and etch rate can be controlled by adjusting the acid concentration and temperature.
Eutectic Alloy: In some cases, eutectic alloys like gold-gallium (Au-Ga) or gold-indium (Au-In) may be used to selectively bond to GaN, and subsequent removal of the alloy can result in selective etching.

Gan etching equipment

Wet Chemical S650 **Gan Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Gan etching machine

The Gan etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Gan etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Gallium Nitride:

Photo etching is a precise process used for intricate designs on Gallium Nitride:

Material Film: Photomasks made of high-quality polymer films with excellent UV resistance are recommended for precise and detailed etching.
Temperature Control: Maintain a stable and controlled temperature during the photoresist exposure and development process to ensure accurate pattern transfer.

Gallium Nitride’s exceptional electronic properties make it a promising material for high-power and high-frequency electronic devices. By understanding the etchants, surface treatment methods, electroforming techniques, metal cleaning, and photo etching processes for Gallium Nitride, manufacturers can achieve exceptional results without compromising the material’s integrity. Applying these insights will enable the production of high-quality Gallium Nitride devices with enhanced performance for diverse semiconductor applications.

View our metal etching products

how to etch Gallium Nitride (GaN)?

Etching Gallium Nitride (GaN) Processing Guidelines

Material	Etchant	Temperature (°C)	Concentration (%)	Estimated Etch Depth (microns)	Etch Quality
Etching Gallium Nitride	Reactive Ion Etching (RIE)	Room temperature	N/A	Variable depth, controlled by RIE process	High-quality (precise)
Etching Gallium Nitride	Hot Phosphoric Acid (H3PO4)	160-180	85%	1-10	High-quality (smooth)
Etching Gallium Nitride	Potassium Hydroxide (KOH)	80-100	30%	0.5-5	High-quality (smooth)
Etching Gallium Nitride	Hydrochloric Acid (HCl)	Room temperature	10%	1-10	Moderate-quality (etched)

Etching Gallium Nitride (GaN) Processing Guidelines

Please note that the estimated etch depths and etch quality may vary based on factors such as exposure time, agitation, and the specific etching conditions, particularly in the case of Reactive Ion Etching (RIE). RIE is a specialized process, and the etch depth is controlled differently compared to wet chemical etching. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, particularly the use of appropriate personal protective equipment.

If you have metal wet etching GaN needs, please feel free to contact us.

FAQs

[FAQS]

Etching GaN Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Indium

04/08/2023 wetetched.com

Indium, a soft and malleable metal, is known for its unique properties, including high thermal and electrical conductivity, low melting point, and excellent solderability.

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View our Indium etching production facility

Indium Characteristics:

Indium possesses several key properties that contribute to its wide-ranging applications:

Low Melting Point: Indium’s low melting point of 156.6°C (313.9°F) allows it to be easily shaped and used in soldering applications.
Softness and Malleability: Indium is a soft and malleable metal, making it easy to form into intricate shapes.
High Thermal Conductivity: Indium exhibits excellent thermal conductivity, making it suitable for heat dissipation in electronic devices.
Electrical Conductivity: Indium is an excellent electrical conductor, further enhancing its applications in the electronics industry.

Metal Etching Indium:

Metal etching is a precise process used to selectively remove material from the surface of indium to create intricate patterns and designs. When etching indium, the choice of etchant is critical for achieving optimal results:

Nitric Acid (HNO3) Solution: Advantages: Nitric acid can be used for controlled etching of indium, offering precise pattern transfer.
Hydrochloric Acid (HCl) Solution: Advantages: HCl solution is effective for etching indium due to its ability to dissolve the oxide layer.
Aqua Regia: Advantages: Aqua regia, a mixture of nitric and hydrochloric acid, is suitable for aggressive etching of indium.

Indium etching equipment

Wet Chemical S650 **Indium Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Indium etching machine

The Indium etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Indium etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Indium:

Photo etching is a precise process used for intricate designs on indium:

Material Film: Photomasks made of high-quality polymer films with excellent UV resistance are recommended for precise and detailed etching.
Temperature Control: Maintain a stable and controlled temperature during the photoresist exposure and development process to ensure accurate pattern transfer.

Indium’s unique properties make it a valuable material for precision machining, especially in electronics and semiconductors. By understanding the etchants, surface treatment methods, electroforming techniques, metal cleaning, and photo etching processes for indium, manufacturers can achieve exceptional results without compromising the material’s integrity. Applying these insights will enable the production of high-quality indium products tailored to specific applications, ranging from electronic components to soldering materials and beyond.

View our metal etching products

how to etch Indium?

Etching Indium Processing Guide

Metal	Etchant	Temperature (°C)	Concentration (%)	Estimated Etch Depth (microns)	Etch Quality
Etching Indium	Nitric Acid (HNO3)	Room temperature	10-15% HNO3	2-10	High-quality (smooth)
Etching Indium	Hydrochloric Acid (HCl)	Room temperature	10-15% HCl	2-10	High-quality (smooth)
Etching Indium	Aqua Regia	Room temperature	1:3 HNO3 to HCl	2-10	High-quality (smooth)

Etching Indium Processing Guide

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the indium surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, particularly in the case of Aqua Regia.

If you have metal wet etching Indium needs, please feel free to contact us.

FAQs

[FAQS]

Etching Indium Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Cobalt

04/08/2023 wetetched.com

Cobalt, a versatile and hard-wearing transition metal, is renowned for its exceptional magnetic properties, high strength, and heat resistance.

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Our Cobalt etching production facility

Cobalt Characteristics:

Cobalt exhibits several key properties that contribute to its broad range of applications:

High Strength: Cobalt’s exceptional strength and hardness make it suitable for wear-resistant components in machinery and tools.
Heat Resistance: With a high melting point of 1495°C (2723°F), cobalt can withstand extreme temperatures.
Magnetic Properties: Cobalt is ferromagnetic, making it valuable in applications requiring strong magnetic properties.
Biocompatibility: Cobalt-chrome alloys are biocompatible, making them ideal for medical implants and dental prosthetics.

Metal Etching Cobalt:

Metal etching is a precise process used to selectively remove material from the surface of cobalt to create intricate patterns and designs. When etching cobalt, the choice of etchant is crucial for achieving optimal results:

Hydrochloric Acid (HCl) Solution: Advantages: HCl solution is effective for etching cobalt due to its ability to dissolve the oxide layer.
Sulfuric Acid (H2SO4) Solution: Advantages: Sulfuric acid can be used for controlled etching of cobalt, allowing for precise pattern transfer.
Aqua Regia: Advantages: Aqua regia, a mixture of nitric and hydrochloric acid, is suitable for aggressive etching of cobalt.

Cobalt etching equipment

Wet Chemical S650 **Cobalt Etching Machine**

Selling Price:$12,000.00

S650 WET Etching MachineDownload

Wet Processing Equipment – Cobalt etching machine

The Cobalt etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Cobalt etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Cobalt:

Photo etching is a precise process used for intricate designs on cobalt:

Material Film: Photomasks made of high-quality polymer films with excellent UV resistance are recommended for precise and detailed etching.
Temperature Control: Maintain a stable and controlled temperature during the photoresist exposure and development process to ensure accurate pattern transfer.

Cobalt’s exceptional properties make it a valuable material for precision machining across diverse industries. By understanding the etchants, surface treatment methods, electroforming techniques, metal cleaning, and photo etching processes for cobalt, manufacturers can achieve exceptional results without compromising the material’s integrity. Applying these insights will enable the production of high-quality cobalt products tailored to specific applications, ranging from aerospace to medical and beyond.

View our metal etching products

how to etch Cobalt?

Etching Cobalt Process Guidelines

Metal Etching	Etchant Etching	Etching Temperature (°C)	Etching Concentration (%)	Estimated Etch Depth (microns)	Etching Quality
Etching Cobalt	Sulfuric Acid (H2SO4)	Room temperature	10-15% H2SO4	5-20	High-quality (smooth)
Etching Cobalt	Hydrochloric Acid (HCl)	Room temperature	10-15% HCl	5-20	High-quality (smooth)
Etching Cobalt	Aqua Regia	Room temperature	1:3 HNO3 to HCl	5-20	High-quality (smooth)

Etching Cobalt Process Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the cobalt surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, particularly in the case of Aqua Regia.

If you have metal wet etching Cobalt needs, please feel free to contact us.

FAQs

[FAQS]

Etching Cobalt Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Tungsten

04/08/2023 wetetched.com

Tungsten, known for its remarkable strength and high melting point, is a versatile metal widely used in various industries.

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View our tungsten etching production facility

Tungsten Characteristics:

Tungsten, a refractory metal, possesses exceptional properties that make it ideal for various applications:

High Melting Point: Tungsten’s melting point of 3422°C (6192°F) makes it suitable for high-temperature applications, such as aerospace components and heating elements.
Superior Strength: Tungsten is renowned for its high tensile strength, enabling it to withstand extreme conditions and heavy loads.
Excellent Electrical Conductivity: Tungsten has one of the highest electrical conductivities among metals, making it invaluable in the electronics and electrical industries.
Density: With a density close to that of gold, tungsten imparts a satisfying heft to precision components.

Etching Tungsten probe

WET is a professional manufacturer of high-quality tungsten probes for batch customization. In the realm of precision engineering, where every micron matters, fine tungsten probes emerge as indispensable tools driving innovation and discovery. As manufacturers strive to meet the exacting demands of various industries, the role of fine tungsten probe batch customization becomes paramount.

Parameter	Description	Typical Range	Application Areas
Probe Tip Diameter	Diameter of the probe tip	0.001 – 0.020 inches	Precision Instrument Probes, Microelectronics
Tip Radius	Radius of the probe tip	0.0005 – 0.005 inches	Semiconductor Testing, Nanotechnology
Taper Length	Length of the taper portion	0.010 – 0.200 inches	Biomedical Research, DNA Sequencing
Overall Length	Total length of the tungsten probe	0.050 – 1.000 inches	Electronics Testing, Material Analysis
Shaft Diameter	Diameter of the probe shaft	0.005 – 0.050 inches	MEMS (Microelectromechanical Systems)
Coating	Optional coating for enhanced properties	Various options available	Optoelectronics, Optical Fiber Testing

Common tungsten needle probe custom specifications

Etching Hook-type 99.5% tungsten needle

These miniature precision microtool tips are helpful for particle manipulation or sample prep. They are available as individual interchangeable tips.

Tungsten alloy with durable 0.001″ radius tip

Etching 90° Microhook 99.5% tungsten

These miniature precision microtool tips are helpful for particle manipulation or sample prep. They are available as individual interchangeable tips.

Etching 99.5% tungsten Microneedle – Straight

These miniature precision microtool tips are helpful for particle manipulation or sample prep. They are available as individual interchangeable tips.

Etching Tungsten [Etching process]:

Metal etching is a precise process used to selectively remove material from the surface of tungsten to create intricate designs and patterns. When etching tungsten, the choice of etchant is critical for optimal results:

Chemical etching of tungsten typically involves the use of a mixture of hydrofluoric acid (HF) and nitric acid (HNO3) as the etchant solution. This combination of acids is effective in etching tungsten because it can react with the metal to form soluble tungsten fluoride compounds. The specific ratio of HF to HNO3 and other process parameters may vary depending on the desired etching rate and surface finish.

It’s essential to exercise extreme caution when working with these acids, as they can be highly corrosive and pose significant safety risks. Proper safety equipment and procedures should be followed when handling and disposing of these chemicals, and the process should be conducted in a well-ventilated fume hood or under controlled conditions in a chemical etching facility.

Ferric chloride (FeCl3) is a common etchant used for a wide range of metals, but it is not effective for etching tungsten. The reason for this is related to the specific chemical properties and reactivity of tungsten.

Ferric chloride primarily works as an oxidizing agent and relies on the formation of metal chlorides to etch metals. However, tungsten is a highly refractory metal with a high melting point and exceptional resistance to oxidation and corrosion. Tungsten forms a stable oxide layer (tungsten oxide) on its surface when exposed to oxygen or oxidizing agents, and this oxide layer acts as a protective barrier, preventing further reaction with the etchant.

Hydrofluoric acid (HF), on the other hand, is effective for etching tungsten because it can dissolve the tungsten oxide layer. HF is a strong acid that can react with metal oxides, including tungsten oxide, to form soluble fluoride complexes. This reaction removes the oxide layer and exposes the underlying tungsten for further etching.

Tungsten etching equipment

Wet Chemical S650 **Tungsten Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Tungsten etching machine

The Tungsten etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Tungsten etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Tungsten:

Photo etching is a precise process used for intricate designs on tungsten:

Material Film: Photomasks made of high-quality polymer films with excellent UV resistance are recommended for precise and detailed etching.
Temperature Control: Maintain a stable and controlled temperature during the photoresist exposure and development process to ensure accurate pattern transfer.

Tungsten’s exceptional properties make it a valuable material for precision machining in various industries. Employing the right etchants, surface treatment methods, and electroforming techniques, alongside proper metal cleaning and photo etching, ensures optimal results without compromising tungsten’s integrity. Understanding these processes and precautions will enable manufacturers to produce high-quality tungsten products for specific applications, ranging from electronics to aerospace and beyond.

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how to etch Tungsten?

Etching Tungsten Process Guidelines

Metal Etching	Etchant	Etching Temperature (°C)	Etching Concentration (%)	Estimated Etching Depth (microns)	Etching Quality
Etching Tungsten	Potassium Hydroxide (KOH)	Room temperature	20-30% KOH	1-10	High-quality (smooth)
Etching Tungsten	H2O2 and H2SO4 (Piranha solution)	Room temperature	30% H2O2, 70% H2SO4	5-20	High-quality (smooth)
Etching Tungsten	NH4OH and H2O2	Room temperature	30% NH4OH, 3% H2O2	2-15	High-quality (smooth)

Etching Tungsten Process Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the tungsten surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals, especially in the case of Piranha solution.

If you have metal wet etching Tungsten needs, please feel free to contact us.

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Etching Tungsten Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Aluminum

04/08/2023 wetetched.com

Aluminum, a versatile and widely used metal, finds its applications in various industries due to its lightweight, corrosion resistance, and excellent thermal conductivity. The etching process plays a crucial role in shaping and refining precision machined aluminum components with high accuracy.

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Aluminum etching production facility

Types of Aluminum and Etching Characteristics

Aluminum alloys are classified based on their alloying elements and properties. Some common types of aluminum alloys include:

1000 Series: Pure aluminum with excellent formability and corrosion resistance but limited strength. Not suitable for heat treatment.
2000 Series: Alloyed with copper, these alloys are known for their excellent strength, but they have poor corrosion resistance.
3000 Series: Alloyed with manganese, offering good formability and moderate strength, along with improved corrosion resistance.
5000 Series: Alloyed with magnesium, providing good weldability, formability, and high strength.
6000 Series: Alloyed with magnesium and silicon, known for their excellent extrudability and versatility.
7000 Series: Alloyed with zinc, these alloys have high strength and are used in aerospace and high-stress applications.

Advantages and Disadvantages of Etching Aluminum Alloys

Each aluminum alloy possesses distinct advantages and disadvantages in wet processing and etching:

Etching 1000 Series: Advantages: Excellent formability, corrosion resistance, and electrical conductivity. Disadvantages: Low strength and not suitable for heat treatment.
Etching 2000 Series: Advantages: High strength and suitable for structural applications. Disadvantages: Poor corrosion resistance and challenging to weld.
Etching 3000 Series: Advantages: Good formability and improved corrosion resistance. Disadvantages: Moderate strength compared to other alloys.
Etching 5000 Series: Advantages: Good weldability, formability, and high strength. Disadvantages: Limited corrosion resistance compared to some other alloys.
Etching 6000 Series: Advantages: Excellent extrudability and versatility. Disadvantages: Lower strength compared to 7000 Series.
Etching 7000 Series: Advantages: High strength and suitable for aerospace and high-stress applications. Disadvantages: Limited corrosion resistance and not as easily extrudable as the 6000 Series.

Metal Etching Aluminum

Metal etching precisely shapes and patterns aluminum components for various applications. The wet processing method involves metal etching machines and specific chemical etchants.

Chemical Etchants Aluminum:

Alkaline Etchants: Utilized for general aluminum etching and surface cleaning.
Acidic Etchants: Preferred for higher precision etching and finer details.

Precautions during Metal Etching:

Follow safety protocols when handling chemical etchants, including proper ventilation and personal protective equipment.
Adhere to etching time, temperature, and concentration to achieve precise etching results.

Etching aluminum is relatively straightforward, and there are several recommended etchants commonly used for this purpose. The choice of etchant depends on the specific application and desired etching characteristics. Here are some of the commonly used etchants for etching aluminum:

Hydrochloric Acid (HCl) Etchant: Dilute hydrochloric acid or a mixture of hydrochloric acid and water is commonly used to etch aluminum. The etch rate can be adjusted by varying the concentration of the acid.
Phosphoric Acid (H3PO4) Etchant: Phosphoric acid is another commonly used etchant for aluminum. It provides a controlled and uniform etch rate and is often used in microelectronic and microfabrication applications.
Nitric Acid (HNO3) Etchant: Nitric acid can be used to etch aluminum, but it is more aggressive than hydrochloric or phosphoric acid, and caution should be exercised while using it.
Sodium Hydroxide (NaOH) Etchant: Alkaline solutions like sodium hydroxide can also be used for etching aluminum. Sodium hydroxide provides a different etching mechanism compared to acids and is often used for specialized applications.
Potassium Hydroxide (KOH) Etchant: Similar to sodium hydroxide, potassium hydroxide can be used to etch aluminum with different etching characteristics.
Chromic Acid (H2CrO4) Etchant: Chromic acid is another etchant used for aluminum, especially in certain microfabrication applications.

Aluminum etching equipment

Wet Chemical S650 **Aluminum Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Aluminum etching machine

The Aluminum etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Aluminum etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Aluminum

Photo etching is a precise and controllable process that uses light-sensitive masks to define patterns on aluminum surfaces. This technique enables intricate designs and high tolerances.

Etching precision machined aluminum materials involves understanding the different types, alloys, and their etching characteristics. The electroforming process, surface treatment, metal cleansing, and metal etching play pivotal roles in achieving precise and high-quality aluminum components. By selecting suitable processes and adhering to necessary precautions, manufacturers can harness the exceptional properties of aluminum for critical applications in various industries.

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how to etch Aluminum?

Etching Aluminum Process Guidelines

Aluminum Alloy Series	Etchant	Etching Temperature (°C)	Etching Concentration (%)	Estimated Etching Depth (microns)	Etching Quality
Etching 1000 Series	Hydrochloric Acid (HCl)	Room temperature	10-15% HCl	10-50	High-quality (smooth)
Etching 2000 Series	Phosphoric Acid (H3PO4)	Room temperature	10-20% H3PO4	10-60	High-quality (smooth)
Etching 3000 Series	Nitric Acid (HNO3)	Room temperature	10-20% HNO3	15-70	High-quality (smooth)
Etching 5000 Series	Sodium Hydroxide (NaOH)	Room temperature	10-20% NaOH	20-80	High-quality (smooth)
Etching 6000 Series	Potassium Hydroxide (KOH)	Room temperature	10-20% KOH	20-90	High-quality (smooth)
Etching 7000 Series	Chromic Acid (H2CrO4)	Room temperature	10-15% H2CrO4	10-50	High-quality (smooth)

Etching Aluminum Process Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the aluminum alloy surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals.

If you have metal wet etching Aluminum needs, please feel free to contact us.

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Etching Aluminum Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Kovar

03/08/2023 wetetched.com

Kovar, a popular alloy known for its low coefficient of thermal expansion, is widely used in precision machining for various industries, including electronics and telecommunications.

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View our Kovar etching production facility

Types of Kovar and Etching Characteristics

Kovar consists of iron, nickel, and cobalt, with varying compositions to suit specific applications. Some common types of Kovar alloys include:

ASTM F-15 Kovar: This alloy has a composition of 29% nickel, 17% cobalt, 53% iron, and trace amounts of other elements. It exhibits excellent thermal expansion properties and is widely used in hermetic sealing applications.
Alloy 52: Comprising 52% nickel and 48% iron, this alloy offers a slightly higher thermal expansion coefficient than ASTM F-15 Kovar. It finds applications in electronic components, glass-to-metal seals, and high-frequency devices.

Advantages and Disadvantages of Kovar Alloys in Wet Processing

Each Kovar alloy possesses distinct advantages and disadvantages in wet processing and etching:

ASTM F-15 Kovar: Advantages: Low coefficient of thermal expansion, ideal for glass-to-metal seals and hermetic packaging. Disadvantages: Relatively higher cost compared to other alloys.
Alloy 52: Advantages: Suitable for high-frequency applications, glass-to-metal seals, and electronic components. Disadvantages: Slightly higher thermal expansion compared to ASTM F-15 Kovar.

Metal Etching Kovar

Metal etching precisely shapes and patterns Kovar components for various applications. The wet processing method involves metal etching machines and specific chemical etchants.

Common Chemical Etchants for Kovar:

Ferric Chloride Etchant: Widely used for etching Kovar and its alloys, offers good control over etching rates.
Cupric Chloride Etchant: Suitable for precise and controlled etching of Kovar materials.

Precautions during Metal Etching:

Follow safety protocols when handling chemical etchants, including proper ventilation and personal protective equipment.
Adhere to etching time, temperature, and concentration to achieve precise etching results.

Kovar etching equipment

Wet Chemical S650 **Kovar Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Kovar etching machine

The Kovar etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Kovar etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Kovar

Photo etching is a precise and controllable process that uses light-sensitive masks to define patterns on Kovar surfaces. This technique enables intricate designs and high tolerances.

Etching precision machined Kovar materials involves understanding the different types, alloys, and their etching characteristics. The electroforming process, surface treatment, metal cleansing, and metal etching play pivotal roles in achieving precise and high-quality Kovar components. By selecting suitable processes and adhering to necessary precautions, manufacturers can harness the exceptional properties of Kovar for critical applications in electronics, telecommunications, and other industries.

View our metal etching products

how to etch Kovar?

Etching Kovar Processing Guidelines

Metal Alloy	Etchant	Etching Temperature (°C)	Etching Concentration (%)	Estimated Etching Depth (microns)	Etching Quality
Etching Kovar	Ferric Chloride	Room temperature	30% FeCl3	10-50	High-quality (smooth)
Etching Kovar	Cupric Chloride	Room temperature	15% CuCl2	10-40	High-quality (smooth)

Etching Kovar Processing Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the Kovar surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals.

If you have metal wet etching Kovar needs, please feel free to contact us.

FAQs

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Etching Kovar Samples

Blog, Metal Etching, Photo Etching

Wet Chemical Etching Copper

03/08/2023 wetetched.com

Copper, renowned for its excellent electrical conductivity and malleability, is a widely used material in precision machining. The etching process plays a vital role in shaping and patterning copper components for various applications.

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View our Copper etching production facility

Types of Copper and Etching Copper Characteristics

Copper encompasses various alloys, each possessing distinct properties catering to specific applications. Some common types of copper include:

Pure Copper (C110): This unalloyed copper exhibits exceptional electrical conductivity and thermal conductivity. Etching pure copper is relatively straightforward and can achieve precise results.
Brass (C260): Brass, a copper-zinc alloy, offers enhanced corrosion resistance and workability. Etching brass requires specialized etchants to maintain its unique properties.
Bronze (C52100): Bronze, a copper-tin alloy, boasts superior strength and wear resistance. Etching bronze demands precise control to achieve desired patterns without compromising its mechanical properties.
Cupronickel (C70600): Cupronickel, a copper-nickel alloy, provides excellent resistance to seawater corrosion. Etching cupronickel requires consideration of the specific alloy composition to achieve the desired results.

Advantages and Disadvantages of Copper Alloys in Wet Processing

Each copper alloy possesses unique advantages and disadvantages in wet processing and etching:

Pure Copper (C110): Advantages: Excellent electrical and thermal conductivity, easy to etch with common etchants. Disadvantages: Prone to corrosion in certain environments, lower mechanical strength compared to alloys.
Brass (C260): Advantages: Enhanced corrosion resistance, attractive appearance, and suitable for decorative applications. Disadvantages: Requires specialized etchants due to its zinc content, which can affect etching rates.
Bronze (C52100): Advantages: High strength and wear resistance, ideal for bearing and bushing applications. Disadvantages: Etching may require precise control to maintain mechanical properties.
Cupronickel (C70600): Advantages: Excellent resistance to seawater corrosion, suitable for marine applications. Disadvantages: Etching may require unique etchants depending on the alloy composition.

Metal Etching Copper

Metal etching precisely shapes and patterns copper components for various applications. The wet processing method employs metal etching machines and specific chemical etchants.

Common Chemical Etchants for Copper:

Ferric Chloride Etchant: Widely used for etching copper and its alloys, offers good control over etching rates.
Cupric Chloride Etchant: Suitable for precise and controlled etching of copper materials.

Precautions during Metal Etching Copper:

Follow safety protocols when handling chemical etchants, including proper ventilation and personal protective equipment.
Adhere to etching time, temperature, and concentration to achieve precise etching results.

Copper etching equipment

Wet Chemical S650 **Copper Etching Machine**

Selling Price:
$12,000.00

S650 WET Etching Machine Download

Wet Processing Equipment – Copper etching machine

The Copper etching machine is used to spray chemical solution to a copper-clad laminator, aluminum substrate, or stainless steel plate, the exposed copper, aluminum, and stainless steel are etched away, retaining the pattern or circuit covered by the corrosion-proof film, so as to achieve the purpose of making pattern or circuit.

This etching machine is an all-in-one small Copper etching machine that is easy to install and can be used immediately after powering on.

Photo Etching Copper

Photo etching is a precise and controllable process that uses light-sensitive masks to define patterns on copper surfaces. This technique enables intricate designs and high tolerances.

Etching precision machined copper materials involves understanding the various types, alloys, and their etching characteristics. Electroforming, surface treatment, metal cleansing, and metal etching are integral processes in achieving precise and high-quality copper components. By selecting suitable processes and following necessary precautions, manufacturers can harness the exceptional properties of copper for critical applications across various industries.

View our metal etching products

how to etch Copper?

Etching Copper Processing Guidelines

Metal Alloy	Etchant	Etching Temperature (°C)	Etching Concentration (%)	Estimated Etching Depth (microns)	Etching Quality
Etching Copper	Ferric Chloride	Room temperature	30% FeCl3	5-20	High-quality (smooth)
Etching Copper	Cupric Chloride	Room temperature	15% CuCl2	5-20	High-quality (smooth)

Copper Etch Processing Guidelines

The values provided are approximate and can vary depending on specific etching conditions, including exposure time and the condition of the copper surface. Always conduct test etches and adjust parameters as needed to achieve your desired results. Additionally, safety precautions should be followed when handling these chemicals.

If you have metal wet etching Copper needs, please feel free to contact us.

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