Chemical Etching Formula
TZM Molybdenum Alloy with H₂O₂(30%)+H₂SO₄(10%)

Formula Summary

The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.

Why H₂O₂(30%)+H₂SO₄(10%) for TZM Molybdenum Alloy?

H₂O₂(30%)+H₂SO₄(10%) earns its place as a TZM Molybdenum Alloy etching formula through repeatability. The bath can be titrated and corrected each shift to hold concentration (as specified) and specific gravity (1.100) within a tight band, which keeps the etch factor near 2.30 and yield near 93.7% run after run.

Process Window & Bath Control

Bath control for TZM Molybdenum Alloy in H₂O₂(30%)+H₂SO₄(10%): temperature 55°C, concentration as specified, specific gravity 1.100. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-1.11 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.

Design Rules & Tolerances

Design rules for this recipe: hole diameter 60-360 μm, line width 100-300 μm, single-side undercut 11-65 μm — all as a function of thickness across 0.05-0.3 mm. The higher the etch factor (this formula holds about 2.30), the tighter the achievable tolerance. Below the minimum feature sizes, yield falls off steeply, so treat those numbers as hard floors rather than targets.

Yield & Production Economics

Expect a yield in the 93.2-93.9% range for TZM Molybdenum Alloy with H₂O₂(30%)+H₂SO₄(10%), with 93.7% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.

Typical Applications

Parts produced with the H₂O₂(30%)+H₂SO₄(10%) formula on TZM Molybdenum Alloy are common in semiconductor lead frames, sputtering masks, and high-temperature electrode grids. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.

Process Equipment & Material Reference

This TZM Molybdenum Alloy formula is part of the standard process library running on our wet chemical etching machine. The same chemistry can be ported to any horizontal spray-etching line of comparable nozzle layout and bath-titration discipline.

Related to this formula, the Molybdenum chemical etching guide page documents the full process envelope for the same alloy family, including pre-treatment chemistry and post-etch inspection criteria.

Production Use Cases for This Formula

Across the markets we serve, the H₂O₂(30%)+H₂SO₄(10%) formula on this page is most often deployed for soy-milk-maker filtration mesh, stainless steel metal filter mesh, and cold-press juicer filtration mesh. These applications share thin-feature geometries that benefit from the predictable etch factor near 2.30 and the low single-side undercut documented above.

Adjacent applications usually transfer onto this same formula with no chemistry change, sometimes only a conveyor speed tweak. Drop a drawing and a target volume and we will return a process card built off the parameters on this page.

Other Metals Etched with H₂O₂(30%)+H₂SO₄(10%)

The H₂O₂(30%)+H₂SO₄(10%) chemistry is also documented for these alloys.

More Molybdenum Formulas

Other formulas in the same material family.

Frequently Asked Questions