Chemical Etching Formula
TZM Molybdenum Alloy
with H₂O₂(30%)+H₂SO₄(10%)
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why H₂O₂(30%)+H₂SO₄(10%) for TZM Molybdenum Alloy?
H₂O₂(30%)+H₂SO₄(10%) earns its place as a TZM Molybdenum Alloy etching formula through repeatability. The bath can be titrated and corrected each shift to hold concentration (as specified) and specific gravity (1.100) within a tight band, which keeps the etch factor near 2.30 and yield near 93.7% run after run.
Process Window & Bath Control
Bath control for TZM Molybdenum Alloy in H₂O₂(30%)+H₂SO₄(10%): temperature 55°C, concentration as specified, specific gravity 1.100. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-1.11 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
Design rules for this recipe: hole diameter 60-360 μm, line width 100-300 μm, single-side undercut 11-65 μm — all as a function of thickness across 0.05-0.3 mm. The higher the etch factor (this formula holds about 2.30), the tighter the achievable tolerance. Below the minimum feature sizes, yield falls off steeply, so treat those numbers as hard floors rather than targets.
• Minimum hole diameter range: 60-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 11-65 μm
• Typical etch factor (EF): 2.30
Yield & Production Economics
Expect a yield in the 93.2-93.9% range for TZM Molybdenum Alloy with H₂O₂(30%)+H₂SO₄(10%), with 93.7% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
Parts produced with the H₂O₂(30%)+H₂SO₄(10%) formula on TZM Molybdenum Alloy are common in semiconductor lead frames, sputtering masks, and high-temperature electrode grids. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
More Molybdenum Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the H₂O₂(30%)+H₂SO₄(10%) chemistry. Send us your part drawing and quantity for a full process quote.
