Metal chemical etching process and equipment animation demonstration
Wet Processing Equipment for All Chemical Acid Etching Purposes
Wet Processing Equipment – wet chemical acid etching machine
Customized chemical acid etching machine will be reasonably matched with your production line according to your production capacity.
Comparison Table
| Name | Characteristics | Main Process | Key Components |
|---|---|---|---|
| Chemical Etching machine | General purpose for various applications | Photoresist and etching | Photoresist unit, etching bath |
| Photo Etching machine | Focus on photographic techniques | Light exposure and development | Photoresist coater, UV exposure unit |
| Chemical Milling machine | Larger-scale, deeper cuts | Material removal for components | Larger etching tanks, waste management |
| Wet Etching machine | Uses liquid etchants | Submersion in etchants | Temperature control, rinsing equipment |
| Chemical Engraving machine | Broader term, can include engraving | Deep material removal | Laser unit, rinsing apparatus |
| Acid Etching machine | Specifically uses acids | Acid application | Acid handling system, safety equipment |
Precision: The etching precision of our machine is 0.0028mm, which allows us to manufacture micro-sized components with high accuracy.
Speed: The etching speed of our machine is determined by the qualityand temperatureof the etching solution used. Typically, higher temperaturesresult in faster etching.
Yield: Our machine achieves a high yield rate of 99.9% due to its high precision and controllable etching speed, which greatly improves manufacturing efficiency and reduces costs.
Manpower: Only two employees are needed to operate and maintain each machine, which reduces labor costs and increases production efficiency.
Popular Wet Processing Combination Equipment
(DES) Develop – Etching – Stripping
DES etching machine
This production line is designed for the process of Develop, Acid Micro Etching, and Stripping, commonly known as DES. In this system, the Develop stage involves the application of a chemical solution to reveal the desired pattern on a substrate. Following that, the Etching stage utilizes a chemical process to selectively remove material from the substrate, shaping it according to the revealed pattern. Finally, in the Stripping stage, any remaining unwanted material is removed, leaving behind the final product. This integrated sequence ensures precise and controlled manufacturing of components or devices.
Selling Price:
$4000.00/m
DES noun explanation
(D) Developing
In photofabrication, developing is the post-exposure process.
Dissolve and remove the photoresist other than those required and form a pattern image of the photoresist.
There is a “soaking method” of immersion in the developer and a “spray method” of spraying, and there is a common use of spray methods in terms of supply efficiency of the developer.
Immediately after the development, a set of heating treatments called post-baking are carried out.
The post-baking box hardens the photoresist, which results in resistance to etching fluid in the next process and improves adherence to substrates.
(E) Etching
Etching is a post-developing process.
While continuously transporting using etchants suitable for metal materials (products), a large amount of etching is performed uniformly by the spray method.
As the management of the etchant is important, an etchant autoanalyzer is installed as a supplementary facility, and various chemicals are automatically supplied based on the feedback of each component analysis to maintain a constant etching rate.
(S) Stripping
Stripping is the post-etching process.
After etching, dissolve the unnecessary photoresist film.
Depending on the type of photo registry, sodium hydroxide heated around 40 to 80℃ or 100℃ is commonly used.
In the case of special resist, mixed solvents such as xylene, alcohols, and ketones may be used.
If the product cannot be stripped by immersion, physical force such as a brush or spray is applied to the product. Immediately after stripping, De-ionized water cleaning, drying, and rust prevention are performed as a set.
DES Line’s Advantages
By installing 3 processes on one device…
- the unit’s area becomes smaller.
- Since there is only one inlet (LD) and outlet (ULD), it can be operated by a minimum number of people.
- It’s cheaper than purchasing three separate machine
DES Line’s disadvantages
By installing 3 processes on one device…
- The tact time of the device is rate-determining in the slowest process.
- When a product defect occurs, it is difficult to determine which process is the cause.
- It is not suitable for various kinds of products whose processing conditions change significantly.
- It is not suitable for research and development purposes that assess and select types of photoresist or film thickness.
SES Etching Maching
The Chemical Etching SES lines with innovative filter systems clean the entire stripping solution before it is returned to the tank container. Depending on the resist type, a cyclone filter system, a drum filter system, or a combination of both is used. The stripping process adjusts to the type of resist and then removes the remaining photoresist on the circuits.
Wet Processing Equipment
Customize your Equipment
- Check out our Wet Processing Equipment.
- Select the product you are interested in, to find all your possible options.
- Then contact your sales rep to get moving on your new piece of equipment.
- If no products catch your eye please contact us. We have done many 100% customized machines!
Our metal etching equipment processing workshop
Features that can be added to a wet etching machine:
- Acid Controller – Popular for cupric chloride etchant
- Drying – Ensures products come out of the line dry.
- Inline Filtration – Results in fewer clogged nozzles and particles in solution.
- Ion Exchange – Saves water in rinse stations.
- pH Controller – Popular option for Alkaline etching. Standard on developing and resisting stripping lines.
- Ventilation Demister – Aids in condensation and recovery of evaporated process chemistry.
- Thin Material Transport – Transport very thin and flexible materials without the use of leaders.
- Drip Pan – Catches chemistry drops or spills
- Chiller Cooling System – Increased cooling capabilities.
- ORP Controller – Popular option for Cupric and Ferric etchers. Comes with a regeneration system.
- Specific Gravity Controller (IX) with Visual Baume – Prevents etchant Baume from getting too low or high.
- Recipe-Driven Operation – Eliminates product variation due to improper machine set-up.
- Data Collection and Archiving – Gives real-time and historical feedback analysis.
Typically used for PCB outer layer etching
The options do not stop there. WET ETCHING wet processing machines are modular — allowing you to configure your machine in any order you desire.
