Chemical Etching Formula
Hastelloy C-22
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for Hastelloy C-22?
On Hastelloy C-22, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every Hastelloy C-22 etch line runs a variant of this formula.
Process Window & Bath Control
Hold the bath at 56°C with concentration 48 °Bé (specific gravity 1.450). Across the 0.1-0.3 mm thickness range, conveyor speed runs from 0.12-0.6 m/min — thinner sheets move faster, thicker sheets slower, in roughly inverse proportion to thickness. A typical mid-range setpoint is 0.20 m/min for 0.20 mm stock. Use redundant PID temperature control to hold the bath within ±1.5°C, and titrate at least once per shift.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 120-360 μm and the minimum line width ranges 100-300 μm across the 0.1-0.3 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 21-63 μm, and the etch factor is about 2.38. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 120-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 21-63 μm
• Typical etch factor (EF): 2.38
Yield & Production Economics
This formula delivers a typical yield of 94.2% (range 93.9-94.5%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
Hastelloy C-22 etched with this recipe typically ends up in turbine-engine seals, high-temperature gaskets, and aerospace fluidic plates. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Nickel Superalloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
