Chemical Etching Formula
SUS316L
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for SUS316L?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like SUS316L. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on SUS316L is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Bath control for SUS316L in FeCl₃+HCl: temperature 48°C, concentration 45 °Bé, specific gravity 1.420. The recipe is tuned for half etch (single-sided). Conveyor speed is the primary throughput control, ranging 0.2-0.82 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 120-360 μm and the minimum line width ranges 100-300 μm across the 0.1-0.3 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 18-55 μm, and the etch factor is about 2.75. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 120-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 18-55 μm
• Typical etch factor (EF): 2.75
Yield & Production Economics
This formula delivers a typical yield of 97.5% (range 97.2-97.6%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
Parts produced with the FeCl₃+HCl formula on SUS316L are common in precision shims, encoder discs, RF/EMI shields, surgical and dental components, fuel-cell bipolar plates, and fine filter meshes. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
More Stainless Steel Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
