Chemical Etching Formula
SUS440C
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for SUS440C?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like SUS440C. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on SUS440C is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Bath control for SUS440C in FeCl₃+HCl: temperature 50°C, concentration 44 °Bé, specific gravity 1.410. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-0.9 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
When laying out artwork for SUS440C at through etch (double-sided), plan for a minimum hole diameter in the 120-600 μm range and a minimum line width in the 100-500 μm range, depending on the chosen sheet thickness within 0.1-0.5 mm. The etch factor of ~2.65 and undercut range of 19-94 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 120-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 19-94 μm
• Typical etch factor (EF): 2.65
Yield & Production Economics
Expect a yield in the 95.3-96.5% range for SUS440C with FeCl₃+HCl, with 96.1% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
SUS440C etched with this recipe typically ends up in precision shims, encoder discs, RF/EMI shields, surgical and dental components, fuel-cell bipolar plates, and fine filter meshes. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Stainless Steel Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
