Chemical Etching Formula
SUS440C
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for SUS440C?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like SUS440C. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on SUS440C is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Bath control for SUS440C in FeCl₃+HCl: temperature 50°C, concentration 44 °Bé, specific gravity 1.410. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-0.9 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
When laying out artwork for SUS440C at through etch (double-sided), plan for a minimum hole diameter in the 120-600 μm range and a minimum line width in the 100-500 μm range, depending on the chosen sheet thickness within 0.1-0.5 mm. The etch factor of ~2.65 and undercut range of 19-94 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 120-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 19-94 μm
• Typical etch factor (EF): 2.65
Yield & Production Economics
Expect a yield in the 95.3-96.5% range for SUS440C with FeCl₃+HCl, with 96.1% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
SUS440C etched with this recipe typically ends up in precision shims, encoder discs, RF/EMI shields, surgical and dental components, fuel-cell bipolar plates, and fine filter meshes. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
Process Equipment & Material Reference
Process equipment for the SUS440C / FeCl₃+HCl combination is built around our wet chemical etching machine platform — closed-loop temperature control, redundant pump headers, and metering for bath replenishment all directly affect the etch factor and yield numbers cited on this page.
The Stainless Steel chemical etching guide reference goes one level above the recipe shown here, surveying the full thickness range, depth options, and common subgrades we run for stainless.
Production Use Cases for This Formula
Parts produced with this SUS440C + FeCl₃+HCl formula end up in a wide range of finished products. Representative production runs we have completed using this exact recipe family include juicer filtration mesh etching, stainless steel mesh for aroma diffusers, and cold-press juicer filtration mesh. Each case shares the same root sensitivity: clean photoresist edges, a tightly held bath SG of 1.410, and a conveyor speed inside the 0.12-0.9 m/min envelope.
Adjacent applications usually transfer onto this same formula with no chemistry change, sometimes only a conveyor speed tweak. Drop a drawing and a target volume and we will return a process card built off the parameters on this page.
More Stainless Steel Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
