Chemical Etching Formula
C2600 brass with FeCl₃

Formula Summary

The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.

Why FeCl₃ for C2600 brass?

On C2600 brass, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every C2600 brass etch line runs a variant of this formula.

Process Window & Bath Control

Bath control for C2600 brass in FeCl₃: temperature 44°C, concentration 38 °Bé, specific gravity 1.360. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-3.11 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.

Design Rules & Tolerances

Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 60-600 μm and the minimum line width ranges 100-500 μm across the 0.05-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 9-89 μm, and the etch factor is about 2.80. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.

Yield & Production Economics

Expect a yield in the 97-98.1% range for C2600 brass with FeCl₃, with 97.8% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.

Typical Applications

C2600 brass etched with this recipe typically ends up in lead frames, busbars, flexible heater elements, RF gaskets, and precision electrical contacts. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.

Process Equipment & Material Reference

Process equipment for the C2600 brass / FeCl₃ combination is built around our wet chemical etching machine platform — closed-loop temperature control, redundant pump headers, and metering for bath replenishment all directly affect the etch factor and yield numbers cited on this page.

If you need a wider view of brass beyond this single recipe, our Brass chemical etching guide covers grade selection, photoresist compatibility, and typical industries that consume this metal in etched form.

Production Use Cases for This Formula

Across the markets we serve, the FeCl₃ formula on this page is most often deployed for juicer filtration mesh etching, ultrasonic mesh for robotic vacuum cleaners, and stainless filtration mesh for vacuum cleaners. These applications share thin-feature geometries that benefit from the predictable etch factor near 2.80 and the low single-side undercut documented above.

If your part falls into one of these classes — or a closely adjacent one — this formula is usually the right starting point. We confirm fit with a short sample run on the actual sheet stock before locking in mask artwork.

Other Metals Etched with FeCl₃

The FeCl₃ chemistry is also documented for these alloys.

More Copper & Brass Formulas

Other formulas in the same material family.

Frequently Asked Questions