Chemical Etching Formula
C5102 phosphor bronze
with FeCl₃
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃ for C5102 phosphor bronze?
On C5102 phosphor bronze, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every C5102 phosphor bronze etch line runs a variant of this formula.
Process Window & Bath Control
Hold the bath at 46°C with concentration 40 °Bé (specific gravity 1.380). Across the 0.05-0.5 mm thickness range, conveyor speed runs from 0.12-2.77 m/min — thinner sheets move faster, thicker sheets slower, in roughly inverse proportion to thickness. A typical mid-range setpoint is 0.40 m/min for 0.20 mm stock. Use redundant PID temperature control to hold the bath within ±1.5°C, and titrate at least once per shift.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 60-600 μm and the minimum line width ranges 100-500 μm across the 0.05-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 9-91 μm, and the etch factor is about 2.74. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 60-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 9-91 μm
• Typical etch factor (EF): 2.74
Yield & Production Economics
This formula delivers a typical yield of 97.4% (range 96.7-97.8%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
C5102 phosphor bronze etched with this recipe typically ends up in lead frames, busbars, flexible heater elements, RF gaskets, and precision electrical contacts. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
Process Equipment & Material Reference
This C5102 phosphor bronze formula is part of the standard process library running on our biomedical blade etching machine. The same chemistry can be ported to any horizontal spray-etching line of comparable nozzle layout and bath-titration discipline.
For a broader treatment of the material itself — alloy variants, surface preparation, and process limits across thickness ranges — see our Copper chemical etching guide. That overview complements the formula-specific bath and conveyor data on this page.
Production Use Cases for This Formula
Parts produced with this C5102 phosphor bronze + FeCl₃ formula end up in a wide range of finished products. Representative production runs we have completed using this exact recipe family include stainless steel shower-head filter mesh, stainless filtration mesh for vacuum cleaners, and stainless steel mesh for aroma diffusers. Each case shares the same root sensitivity: clean photoresist edges, a tightly held bath SG of 1.380, and a conveyor speed inside the 0.12-2.77 m/min envelope.
Adjacent applications usually transfer onto this same formula with no chemistry change, sometimes only a conveyor speed tweak. Drop a drawing and a target volume and we will return a process card built off the parameters on this page.
More Copper & Brass Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃ chemistry. Send us your part drawing and quantity for a full process quote.
