Chemical Etching Formula
QAl9-2 Aluminum Bronze
with FeCl₃
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃ for QAl9-2 Aluminum Bronze?
On QAl9-2 Aluminum Bronze, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every QAl9-2 Aluminum Bronze etch line runs a variant of this formula.
Process Window & Bath Control
The process window for this FeCl₃ formula centres on 48°C and 42 °Bé. Conveyor speed spans 0.21-2.64 m/min over the 0.05-0.3 mm thickness band; the typical operating point is 0.69 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
When laying out artwork for QAl9-2 Aluminum Bronze at through etch (double-sided), plan for a minimum hole diameter in the 60-360 μm range and a minimum line width in the 100-300 μm range, depending on the chosen sheet thickness within 0.05-0.3 mm. The etch factor of ~2.65 and undercut range of 9-57 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 60-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 9-57 μm
• Typical etch factor (EF): 2.65
Yield & Production Economics
Typical mass-production yield for QAl9-2 Aluminum Bronze in the FeCl₃ system is 97.4%, within an observed range of 97-97.7%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
Parts produced with the FeCl₃ formula on QAl9-2 Aluminum Bronze are common in lead frames, busbars, flexible heater elements, RF gaskets, and precision electrical contacts. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
More Copper & Brass Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃ chemistry. Send us your part drawing and quantity for a full process quote.
