Chemical Etching Formula
QAl9-2 Aluminum Bronze
with FeCl₃
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃ for QAl9-2 Aluminum Bronze?
On QAl9-2 Aluminum Bronze, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every QAl9-2 Aluminum Bronze etch line runs a variant of this formula.
Process Window & Bath Control
The process window for this FeCl₃ formula centres on 48°C and 42 °Bé. Conveyor speed spans 0.21-2.64 m/min over the 0.05-0.3 mm thickness band; the typical operating point is 0.69 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
When laying out artwork for QAl9-2 Aluminum Bronze at through etch (double-sided), plan for a minimum hole diameter in the 60-360 μm range and a minimum line width in the 100-300 μm range, depending on the chosen sheet thickness within 0.05-0.3 mm. The etch factor of ~2.65 and undercut range of 9-57 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 60-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 9-57 μm
• Typical etch factor (EF): 2.65
Yield & Production Economics
Typical mass-production yield for QAl9-2 Aluminum Bronze in the FeCl₃ system is 97.4%, within an observed range of 97-97.7%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
Parts produced with the FeCl₃ formula on QAl9-2 Aluminum Bronze are common in lead frames, busbars, flexible heater elements, RF gaskets, and precision electrical contacts. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
Process Equipment & Material Reference
On the shop floor, this QAl9-2 Aluminum Bronze + FeCl₃ recipe is implemented on a wet chemical etching machine. The 48°C bath setpoint and 0.21-2.64 m/min conveyor range correspond to verified production envelopes on that equipment for through etch (double-sided).
The Copper chemical etching guide reference goes one level above the recipe shown here, surveying the full thickness range, depth options, and common subgrades we run for copper.
Production Use Cases for This Formula
Production examples for the QAl9-2 Aluminum Bronze / FeCl₃ recipe span stainless steel mesh for aroma diffusers, stainless steel metal filter mesh, and tea-infuser custom filter etching. In every case, the etch factor and undercut figures on this page are the dominant tolerance drivers — bath maintenance discipline matters more than equipment headline rating.
Adjacent applications usually transfer onto this same formula with no chemistry change, sometimes only a conveyor speed tweak. Drop a drawing and a target volume and we will return a process card built off the parameters on this page.
More Copper & Brass Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃ chemistry. Send us your part drawing and quantity for a full process quote.
