Chemical Etching Formula
SUS321
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for SUS321?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like SUS321. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on SUS321 is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Hold the bath at 50°C with concentration 45 °Bé (specific gravity 1.420). Across the 0.1-0.5 mm thickness range, conveyor speed runs from 0.12-0.95 m/min — thinner sheets move faster, thicker sheets slower, in roughly inverse proportion to thickness. A typical mid-range setpoint is 0.34 m/min for 0.20 mm stock. Use redundant PID temperature control to hold the bath within ±1.5°C, and titrate at least once per shift.
Design Rules & Tolerances
When laying out artwork for SUS321 at through etch (double-sided), plan for a minimum hole diameter in the 120-600 μm range and a minimum line width in the 100-500 μm range, depending on the chosen sheet thickness within 0.1-0.5 mm. The etch factor of ~2.70 and undercut range of 19-93 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 120-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 19-93 μm
• Typical etch factor (EF): 2.70
Yield & Production Economics
Expect a yield in the 95.5-96.7% range for SUS321 with FeCl₃+HCl, with 96.4% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
Typical applications for SUS321 processed with FeCl₃+HCl include precision shims, encoder discs, RF/EMI shields, surgical and dental components, fuel-cell bipolar plates, and fine filter meshes. The formula's tolerance band and yield make it well suited to medium-to-high-volume precision flat parts.
Process Equipment & Material Reference
This SUS321 formula is part of the standard process library running on our wet chemical etching machine. The same chemistry can be ported to any horizontal spray-etching line of comparable nozzle layout and bath-titration discipline.
For a broader treatment of the material itself — alloy variants, surface preparation, and process limits across thickness ranges — see our Stainless Steel chemical etching guide. That overview complements the formula-specific bath and conveyor data on this page.
Production Use Cases for This Formula
Parts produced with this SUS321 + FeCl₃+HCl formula end up in a wide range of finished products. Representative production runs we have completed using this exact recipe family include stainless steel shower-head filter mesh, stainless steel mesh for aroma diffusers, and stainless filtration mesh for vacuum cleaners. Each case shares the same root sensitivity: clean photoresist edges, a tightly held bath SG of 1.420, and a conveyor speed inside the 0.12-0.95 m/min envelope.
Designs that sit slightly outside this thickness or feature-size envelope are usually addressable by a sister formula in the same etchant family. The bath chemistry stays the same; the tuning shifts to conveyor speed and resist choice.
More Stainless Steel Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
