Chemical Etching Formula
SUS420J2
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for SUS420J2?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like SUS420J2. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on SUS420J2 is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Bath control for SUS420J2 in FeCl₃+HCl: temperature 50°C, concentration 44 °Bé, specific gravity 1.410. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-1.08 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 120-600 μm and the minimum line width ranges 100-500 μm across the 0.1-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 18-91 μm, and the etch factor is about 2.75. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 120-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 18-91 μm
• Typical etch factor (EF): 2.75
Yield & Production Economics
Typical mass-production yield for SUS420J2 in the FeCl₃+HCl system is 96.7%, within an observed range of 95.9-97.1%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
SUS420J2 etched with this recipe typically ends up in precision shims, encoder discs, RF/EMI shields, surgical and dental components, fuel-cell bipolar plates, and fine filter meshes. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Stainless Steel Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
