Chemical Etching Formula
Al1060
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for Al1060?
On Al1060, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every Al1060 etch line runs a variant of this formula.
Process Window & Bath Control
Bath control for Al1060 in FeCl₃+HCl: temperature 38°C, concentration 30 °Bé, specific gravity 1.250. The recipe is tuned for through etch (double-sided). Conveyor speed is the primary throughput control, ranging 0.12-2.9 m/min across the supported thickness range. Check specific gravity each shift with a calibrated hydrometer and correct with fresh make-up or water as needed.
Design Rules & Tolerances
When laying out artwork for Al1060 at through etch (double-sided), plan for a minimum hole diameter in the 60-600 μm range and a minimum line width in the 100-500 μm range, depending on the chosen sheet thickness within 0.05-0.5 mm. The etch factor of ~2.60 and undercut range of 10-96 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 60-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 10-96 μm
• Typical etch factor (EF): 2.60
Yield & Production Economics
This formula delivers a typical yield of 97.5% (range 96.8-97.9%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
Typical applications for Al1060 processed with FeCl₃+HCl include lightweight RF shields, heat-spreader masks, nameplates, decorative trim, and lightweight structural lattices. The formula's tolerance band and yield make it well suited to medium-to-high-volume precision flat parts.
Process Equipment & Material Reference
On the shop floor, this Al1060 + FeCl₃+HCl recipe is implemented on a wet chemical etching machine. The 38°C bath setpoint and 0.12-2.9 m/min conveyor range correspond to verified production envelopes on that equipment for through etch (double-sided).
The Aluminum chemical etching guide reference goes one level above the recipe shown here, surveying the full thickness range, depth options, and common subgrades we run for aluminum.
Production Use Cases for This Formula
Production examples for the Al1060 / FeCl₃+HCl recipe span soy-milk-maker filtration mesh, stainless steel shower-head filter mesh, and mobile-phone earpiece mesh. In every case, the etch factor and undercut figures on this page are the dominant tolerance drivers — bath maintenance discipline matters more than equipment headline rating.
Adjacent applications usually transfer onto this same formula with no chemistry change, sometimes only a conveyor speed tweak. Drop a drawing and a target volume and we will return a process card built off the parameters on this page.
More Aluminum Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.