Chemical Etching Formula
Al2014
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for Al2014?
On Al2014, the ferric chloride system attacks the alloy's oxide layer continuously while ferric ions drive dissolution. It is regenerable, compatible with standard photolithography, and produces clean burr-free edges — which is why nearly every Al2014 etch line runs a variant of this formula.
Process Window & Bath Control
The process window for this FeCl₃+HCl formula centres on 43°C and 34 °Bé. Conveyor speed spans 0.12-1.08 m/min over the 0.1-0.5 mm thickness band; the typical operating point is 0.32 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
When laying out artwork for Al2014 at through etch (double-sided), plan for a minimum hole diameter in the 120-600 μm range and a minimum line width in the 100-500 μm range, depending on the chosen sheet thickness within 0.1-0.5 mm. The etch factor of ~2.48 and undercut range of 20-101 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 120-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 20-101 μm
• Typical etch factor (EF): 2.48
Yield & Production Economics
This formula delivers a typical yield of 97.2% (range 96.5-97.5%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
Parts produced with the FeCl₃+HCl formula on Al2014 are common in lightweight RF shields, heat-spreader masks, nameplates, decorative trim, and lightweight structural lattices. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
More Aluminum Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
