Chemical Etching Formula
Al1100
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for Al1100?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like Al1100. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on Al1100 is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
The process window for this FeCl₃+HCl formula centres on 38°C and 30 °Bé. Conveyor speed spans 0.12-21.41 m/min over the 0.01-0.5 mm thickness band; the typical operating point is 1.50 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 15-600 μm and the minimum line width ranges 100-500 μm across the 0.01-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 2-95 μm, and the etch factor is about 2.62. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 15-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 2-95 μm
• Typical etch factor (EF): 2.62
Yield & Production Economics
Expect a yield in the 96.8-98.5% range for Al1100 with FeCl₃+HCl, with 97.8% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
Al1100 etched with this recipe typically ends up in lightweight RF shields, heat-spreader masks, nameplates, decorative trim, and lightweight structural lattices. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
Process Equipment & Material Reference
On the shop floor, this Al1100 + FeCl₃+HCl recipe is implemented on a knife-mold etching machine. The 38°C bath setpoint and 0.12-21.41 m/min conveyor range correspond to verified production envelopes on that equipment for through etch (double-sided).
The Aluminum chemical etching guide reference goes one level above the recipe shown here, surveying the full thickness range, depth options, and common subgrades we run for aluminum.
Production Use Cases for This Formula
Production examples for the Al1100 / FeCl₃+HCl recipe span cold-press juicer filtration mesh, juicer filtration mesh etching, and stainless steel shower-head filter mesh. In every case, the etch factor and undercut figures on this page are the dominant tolerance drivers — bath maintenance discipline matters more than equipment headline rating.
Designs that sit slightly outside this thickness or feature-size envelope are usually addressable by a sister formula in the same etchant family. The bath chemistry stays the same; the tuning shifts to conveyor speed and resist choice.
More Aluminum Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Sources & References
- ASTM E407: Standard Practice for Microetching Metals and Alloys
- ASTM B912: Standard Specification for Passivation of Stainless Steels
- Photo Chemical Machining Institute — process capability guidelines
- NIST Engineering Statistics Handbook — process tolerance and capability
Standards are referenced for context. Always confirm parameters against the current published edition and your own process validation.
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
