Chemical Etching Formula
Kovar alloy
with FeCl₃+HCl
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why FeCl₃+HCl for Kovar alloy?
Ferric-chloride-based formulas are the industrial workhorse for ferrous, nickel, and copper-bearing alloys like Kovar alloy. The Fe³⁺ ion oxidizes the metal surface; where HCl is present it regenerates dissolved species and stabilizes chloride concentration. The result on Kovar alloy is anisotropic etching with predictable undercut and an easily regenerated spent bath.
Process Window & Bath Control
Hold the bath at 50°C with concentration 44 °Bé (specific gravity 1.410). Across the 0.01 mm thickness range, conveyor speed runs from 30.36 m/min — thinner sheets move faster, thicker sheets slower, in roughly inverse proportion to thickness. A typical mid-range setpoint is 30.36 m/min for 0.01 mm stock. Use redundant PID temperature control to hold the bath within ±1.5°C, and titrate at least once per shift.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 12 μm and the minimum line width ranges 100 μm across the 0.01 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 2 μm, and the etch factor is about 2.75. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 12 μm
• Minimum line width range: 100 μm
• Single-side undercut range: 2 μm
• Typical etch factor (EF): 2.75
Yield & Production Economics
Typical mass-production yield for Kovar alloy in the FeCl₃+HCl system is 97.0%, within an observed range of 97%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
Kovar alloy etched with this recipe typically ends up in hermetic sealing rings, lead frames matched to glass/ceramic, and magnetic shielding. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Precision Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the FeCl₃+HCl chemistry. Send us your part drawing and quantity for a full process quote.
