Chemical Etching Formula
Ta1 Pure Tantalum
with HF(8%)+HNO₃(30%)
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why HF(8%)+HNO₃(30%) for Ta1 Pure Tantalum?
For Ta1 Pure Tantalum, the HF/HNO₃ blend works where chloride chemistries stall: fluoride dissolves the stable oxide, nitric acid re-oxidizes the metal, and the two cycle to give a steady etch. Concentration and temperature control are critical here because the rate is strongly chemistry-dependent.
Process Window & Bath Control
The process window for this HF(8%)+HNO₃(30%) formula centres on 38°C and as specified. Conveyor speed spans 0.12-0.87 m/min over the 0.05-0.3 mm thickness band; the typical operating point is 0.19 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
When laying out artwork for Ta1 Pure Tantalum at through etch (double-sided), plan for a minimum hole diameter in the 60-360 μm range and a minimum line width in the 100-300 μm range, depending on the chosen sheet thickness within 0.05-0.3 mm. The etch factor of ~2.20 and undercut range of 11-68 μm determine how much the mask must be biased to land the finished dimension on target.
• Minimum hole diameter range: 60-360 μm
• Minimum line width range: 100-300 μm
• Single-side undercut range: 11-68 μm
• Typical etch factor (EF): 2.20
Yield & Production Economics
Typical mass-production yield for Ta1 Pure Tantalum in the HF(8%)+HNO₃(30%) system is 92.7%, within an observed range of 92.2-92.9%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
Ta1 Pure Tantalum etched with this recipe typically ends up in medical implants, surgical instruments, aerospace brackets, and corrosion-resistant filters. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Titanium Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the HF(8%)+HNO₃(30%) chemistry. Send us your part drawing and quantity for a full process quote.
