Chemical Etching Formula
TA1 commercially pure titanium
with HF(5%)+HNO₃(30%)
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why HF(5%)+HNO₃(30%) for TA1 commercially pure titanium?
For TA1 commercially pure titanium, the HF/HNO₃ blend works where chloride chemistries stall: fluoride dissolves the stable oxide, nitric acid re-oxidizes the metal, and the two cycle to give a steady etch. Concentration and temperature control are critical here because the rate is strongly chemistry-dependent.
Process Window & Bath Control
The process window for this HF(5%)+HNO₃(30%) formula centres on 30°C and as specified. Conveyor speed spans 4.43-15.44 m/min over the 0.01-0.03 mm thickness band; the typical operating point is 7.75 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
Design rules for this recipe: hole diameter 15-30 μm, line width 100 μm, single-side undercut 46086 μm — all as a function of thickness across 0.01-0.03 mm. The higher the etch factor (this formula holds about 2.38), the tighter the achievable tolerance. Below the minimum feature sizes, yield falls off steeply, so treat those numbers as hard floors rather than targets.
• Minimum hole diameter range: 15-30 μm
• Minimum line width range: 100 μm
• Single-side undercut range: 46086 μm
• Typical etch factor (EF): 2.38
Yield & Production Economics
Expect a yield in the 96% range for TA1 commercially pure titanium with HF(5%)+HNO₃(30%), with 96.0% typical on a well-controlled line. Most rejects trace back to upstream coating and exposure rather than to the etch bath itself, so tightening photolithography control is usually the fastest path to a higher number.
Typical Applications
TA1 commercially pure titanium etched with this recipe typically ends up in medical implants, surgical instruments, aerospace brackets, and corrosion-resistant filters. Because chemical etching applies no mechanical or thermal load, the finished features are free of work-hardening and heat-affected zones — a decisive advantage over stamping or laser cutting for these uses.
More Titanium Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the HF(5%)+HNO₃(30%) chemistry. Send us your part drawing and quantity for a full process quote.
