Chemical Etching Formula
Ti-3Al-2.5V
with HF(5%)+HNO₃(30%)
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why HF(5%)+HNO₃(30%) for Ti-3Al-2.5V?
Hydrofluoric/nitric formulas are used for refractory and titanium-family metals such as Ti-3Al-2.5V because the fluoride ion is one of the few species that will break down their tenacious passive oxide. The nitric component oxidizes the freshly exposed metal so the fluoride can keep working. Handling demands are high, but for Ti-3Al-2.5V there is rarely a practical alternative.
Process Window & Bath Control
The process window for this HF(5%)+HNO₃(30%) formula centres on 34°C and as specified. Conveyor speed spans 0.12-1.36 m/min over the 0.05-0.5 mm thickness band; the typical operating point is 0.17 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 60-600 μm and the minimum line width ranges 100-500 μm across the 0.05-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 11-109 μm, and the etch factor is about 2.30. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 60-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 11-109 μm
• Typical etch factor (EF): 2.30
Yield & Production Economics
Typical mass-production yield for Ti-3Al-2.5V in the HF(5%)+HNO₃(30%) system is 95.1%, within an observed range of 94.2-95.4%. The dominant yield-loss modes are photoresist pinhole defects and rinse-water contamination. Improving incoming sheet quality and photoresist coating consistency gives the highest yield-improvement leverage for this formula.
Typical Applications
Typical applications for Ti-3Al-2.5V processed with HF(5%)+HNO₃(30%) include medical implants, surgical instruments, aerospace brackets, and corrosion-resistant filters. The formula's tolerance band and yield make it well suited to medium-to-high-volume precision flat parts.
More Titanium Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the HF(5%)+HNO₃(30%) chemistry. Send us your part drawing and quantity for a full process quote.
