Chemical Etching Formula
TC4(Ti-6Al-4V) with HF(5%)+HNO₃(30%)

Formula Summary

The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.

Why HF(5%)+HNO₃(30%) for TC4(Ti-6Al-4V)?

For TC4(Ti-6Al-4V), the HF/HNO₃ blend works where chloride chemistries stall: fluoride dissolves the stable oxide, nitric acid re-oxidizes the metal, and the two cycle to give a steady etch. Concentration and temperature control are critical here because the rate is strongly chemistry-dependent.

Process Window & Bath Control

The process window for this HF(5%)+HNO₃(30%) formula centres on 35°C and as specified. Conveyor speed spans 0.12-30.76 m/min over the 0.01-0.5 mm thickness band; the typical operating point is 0.99 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.

Design Rules & Tolerances

Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 8-600 μm and the minimum line width ranges 100-500 μm across the 0.01-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 1-110 μm, and the etch factor is about 2.28. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.

Yield & Production Economics

This formula delivers a typical yield of 95.1% (range 94.2-95.5%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.

Typical Applications

Parts produced with the HF(5%)+HNO₃(30%) formula on TC4(Ti-6Al-4V) are common in medical implants, surgical instruments, aerospace brackets, and corrosion-resistant filters. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.

Process Equipment & Material Reference

Production of TC4(Ti-6Al-4V) parts using the HF(5%)+HNO₃(30%) formula described above runs on a precision acid cleaning machine configured for through etch (double-sided). The bath chemistry, conveyor speed, and rinse cascade detailed on this page reflect the operating profile we use on a live spray-etching line for this alloy.

If you need a wider view of titanium beyond this single recipe, our Titanium chemical etching guide covers grade selection, photoresist compatibility, and typical industries that consume this metal in etched form.

Production Use Cases for This Formula

Parts produced with this TC4(Ti-6Al-4V) + HF(5%)+HNO₃(30%) formula end up in a wide range of finished products. Representative production runs we have completed using this exact recipe family include soy-milk-maker filtration mesh, stainless steel mesh for aroma diffusers, and high-speed air-intake mesh for hair dryers. Each case shares the same root sensitivity: clean photoresist edges, a tightly held bath SG of 1.190, and a conveyor speed inside the 0.12-30.76 m/min envelope.

If your part falls into one of these classes — or a closely adjacent one — this formula is usually the right starting point. We confirm fit with a short sample run on the actual sheet stock before locking in mask artwork.

Other Metals Etched with HF(5%)+HNO₃(30%)

The HF(5%)+HNO₃(30%) chemistry is also documented for these alloys.

More Titanium Alloys Formulas

Other formulas in the same material family.

Frequently Asked Questions