Chemical Etching Formula
TC4(Ti-6Al-4V)
with HF(5%)+HNO₃(30%)
Formula Summary
The table below summarizes every parameter that defines this etching formula. Values listed as ranges scale with sheet thickness across the supported band.
Why HF(5%)+HNO₃(30%) for TC4(Ti-6Al-4V)?
For TC4(Ti-6Al-4V), the HF/HNO₃ blend works where chloride chemistries stall: fluoride dissolves the stable oxide, nitric acid re-oxidizes the metal, and the two cycle to give a steady etch. Concentration and temperature control are critical here because the rate is strongly chemistry-dependent.
Process Window & Bath Control
The process window for this HF(5%)+HNO₃(30%) formula centres on 35°C and as specified. Conveyor speed spans 0.12-30.76 m/min over the 0.01-0.5 mm thickness band; the typical operating point is 0.99 m/min. Every 5°C drop in bath temperature requires roughly a 30% reduction in conveyor speed to hold the same etch depth, so temperature stability is the single biggest lever on consistency.
Design Rules & Tolerances
Feature sizes scale with sheet thickness. For this formula the minimum hole diameter ranges 8-600 μm and the minimum line width ranges 100-500 μm across the 0.01-0.5 mm band, following the industry 1.2× (hole) and 1.0× (line) thickness rules. Single-side undercut ranges 1-110 μm, and the etch factor is about 2.28. Size your photomask by subtracting twice the expected undercut from each finished feature dimension.
• Minimum hole diameter range: 8-600 μm
• Minimum line width range: 100-500 μm
• Single-side undercut range: 1-110 μm
• Typical etch factor (EF): 2.28
Yield & Production Economics
This formula delivers a typical yield of 95.1% (range 94.2-95.5%). At that rate, per-part economics are driven mostly by fixed photomask and setup cost for small batches and by sheet utilisation for large runs. The chemistry itself does not change with quantity, so the same recipe serves prototype and production volumes.
Typical Applications
Parts produced with the HF(5%)+HNO₃(30%) formula on TC4(Ti-6Al-4V) are common in medical implants, surgical instruments, aerospace brackets, and corrosion-resistant filters. The burr-free, stress-free nature of chemical etching makes it the preferred process wherever flatness and edge quality matter more than raw throughput.
More Titanium Alloys Formulas
Other formulas in the same material family.
Frequently Asked Questions
Need a Quote for This Process?
WET Etched runs production wet chemical etching lines using the HF(5%)+HNO₃(30%) chemistry. Send us your part drawing and quantity for a full process quote.
